| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1dd870bc0073faf2ccc905f92fd4d02f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2247-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D47-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F23J15-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D47-00 |
| filingDate |
2008-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70d185ddb1f95ca12de018442980dbe1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff09d05fd32dba47388564ce84931aa0 |
| publicationDate |
2009-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090132145-A |
| titleOfInvention |
Waste gas treatment system |
| abstract |
Disclosed is a waste gas treatment apparatus including human hazardous substances, pollutants, and the like used in the manufacture of semiconductors and flat panel displays. The waste gas treating apparatus according to the present invention includes a heat treatment unit for purifying waste gas, a chamber providing a treatment space in which the waste gas is treated by the heat treatment unit, and water to prevent recombination of the waste gas pyrolyzed in the treatment space. It comprises a recombination prevention gas comprising a. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101227441-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102063786-B1 |
| priorityDate |
2008-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |