| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0338
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76832
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76831 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2009-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9c580b7fb1ff4b8126ecbdf441d4fd0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7103f0c62f2f81f2e0ba1d86f60775dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3dde0112a885e960a22e6c3d10dc8b59
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb786a45a65ae84c52c519b6edc55f96 |
| publicationDate |
2009-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090130836-A |
| titleOfInvention |
Air gap formation and integration with patterning cap |
| abstract |
Methods of patterning a film and the resulting structures are described herein. In one embodiment, the method includes forming an amorphous carbon mask over the substrate; Depositing a spacer layer over the amorphous carbon mask; Etching the spacer layer to form a spacer and expose the amorphous carbon mask; Exposing the substrate layer by selectively removing the amorphous carbon mask relative to the spacer; Depositing a gap fill layer around the spacer to cover the substrate layer but to expose the spacer; Removing the spacers selectively to the gap fill layer to form a gap fill layer over the substrate; Transferring the gap fill mask into the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170065419-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101442389-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9570316-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10290537-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160138290-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11264272-B2 |
| priorityDate |
2008-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |