abstract |
A low etch rate etchant and a method of manufacturing a display substrate using the same are disclosed. The low etch rate etchant includes hydrogen peroxide (H 2 O 2 ) to etch the metal film and / or metal oxide film, additives that inhibit the reaction of hydrogen peroxide and extra solvent. Thereby, the manufacturing reliability of the signal wiring which meets the requirements of a large area and high resolution can be improved. |