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publicationDate 2009-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20090127997-A
titleOfInvention Low etch rate etchant and method of manufacturing display substrate using same
abstract A low etch rate etchant and a method of manufacturing a display substrate using the same are disclosed. The low etch rate etchant includes hydrogen peroxide (H 2 O 2 ) to etch the metal film and / or metal oxide film, additives that inhibit the reaction of hydrogen peroxide and extra solvent. Thereby, the manufacturing reliability of the signal wiring which meets the requirements of a large area and high resolution can be improved.
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