| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate |
2009-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_074597c9c4375b533b80163b28edd8ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf2155c496ae02c5aae5b76aba16d4ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47abf65193b54873b2081d45045f889c |
| publicationDate |
2009-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090127221-A |
| titleOfInvention |
Photosensitive Resin Composition and Photosensitive Element |
| abstract |
(A) Photosensitive resin composition containing the polyamic acid which has a C5-C20 alkylene chain or alicyclic skeleton in a principal chain, the photopolymerizable compound which has (B) vinyl group containing epoxy resin, and (C) photoinitiator. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9957390-B2 |
| priorityDate |
2008-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |