http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090124198-A

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filingDate 2008-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_040306c8259ae15ce5ce6129b4b01182
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publicationDate 2009-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20090124198-A
titleOfInvention Thinner composition for removing photosensitive resin and antireflection film
abstract The present invention relates to a thinner composition for removing a photosensitive resin and an anti-reflection film used in a semiconductor device and a thin film transistor liquid crystal display device manufacturing process, more specifically, 10 to 70% by weight of propylene glycol alkyl ether acetate (PGMEA); 5 to 40 weight percent of methyl-3-methoxy propionate (MMP); 5 to 50 weight percent cyclohexanone (CHN); And gamma butyrolactone (GBL) relates to a thinner composition for removing a photosensitive resin and anti-reflection film comprising 1 to 10% by weight.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160086631-A
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