http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090102217-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2008-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef34acf3a41bebb8787509f606671d81 |
| publicationDate | 2009-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20090102217-A |
| titleOfInvention | Bi-layer photoresist polymer, composition comprising the same and manufacturing method of photoresist pattern using it |
| abstract | The present invention relates to a polymer for two-layer photoresist, a photoresist composition containing the polymer and a method of forming a photoresist pattern using the same, and more particularly, a photo consisting of a polymerization repeating unit of a silicon compound and a compound having a high carbon content. By providing a polymer comprising a resist polymer and a photoresist composition containing the polymer, and forming a second photoresist film using the photoresist composition on the first photoresist film, the photoresist pattern is stable without collapse of the photoresist pattern. A method of forming a photoresist pattern capable of performing a subsequent etching process. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10319590-B2 |
| priorityDate | 2008-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 75.