Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3229 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5445 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5481 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-64 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-6261 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-6263 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-62675 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F17-235 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-632 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F17-235 |
filingDate |
2009-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c778329cca29f828c000ddb09cfcec4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d641c8b41ddb2afd7f0790a6ecea5515 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cc5e3b54b5d1b4461ea117b8cc68cbd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a24a7e37796da5eba50c074fa1d78bb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_255127c4b7348e8330078f480921fdf9 |
publicationDate |
2009-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20090094057-A |
titleOfInvention |
Cerium oxide powder, method for preparing the same, and cmp slurry comprising the same |
abstract |
The present invention relates to a cerium oxide powder for a CMP abrasive which can improve the removal selectivity and / or the regional flatness of the silicon oxide film relative to the silicon nitride film during chemical mechanical polishing in a semiconductor process.n n n More specifically, the present invention is a cerium oxide powder prepared by using cerium carbonate having a hexagonal crystal structure as a precursor; CMP slurry characterized by including this as an abrasive; And a shallow trench isolation method for a semiconductor device characterized by applying the CMP slurry as a polishing liquid. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101492234-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101483450-B1 |
priorityDate |
2006-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |