http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090084872-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate | 2007-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4d47da18fd2a25fc78651b45ddb7e1c |
| publicationDate | 2009-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20090084872-A |
| titleOfInvention | A device having a photosensitive siloxane composition, a cured film formed therefrom, and a cured film |
| abstract | Low curing shrinkage by the photosensitive siloxane composition containing (a) polysiloxane, (b) quinonediazide compound, (c) solvent, and (d) imide silane compound represented by General formula (1)-(3) In addition, the photosensitive siloxane composition which is excellent in transparency after thermosetting, the crack generation after impregnation in an alkaline solvent is suppressed, and the cured film excellent in adhesiveness with a board | substrate is obtained is provided. [Each R < 1> may be same or different, respectively, and represents a C1-C6 alkyl group, a C1-C6 alkoxyl group, a phenyl group, a phenoxy group, or the organic group in which they were substituted. In addition, R < 2> and R < 4> is a C1-C10 divalent organic group, R < 3> is a C2-C20 organic group which does not contain a silicon atom (However, in General formula (1), R < 3> is other than a phenyl group. An organic group is represented, in the case of General formula (2), R < 3> represents the organic group which does not contain an unsaturated bond other than an alicyclic group.), R <a> represents the C1-C20 organic group which does not contain a hydrogen atom or a silicon atom. ]n n n Photosensitive siloxane composition, cured film, element |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150088733-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120074272-A |
| priorityDate | 2006-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 255.