| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 |
| filingDate |
2008-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45aa28f8c6fd862c0b27f10aa9f4abb8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_748d1a281dd79d503f6154cbc3d36e23 |
| publicationDate |
2009-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090080395-A |
| titleOfInvention |
Composition for self-assembly pattern and method of forming a fine pattern of a semiconductor device using the composition |
| abstract |
The present invention relates to a composition for self-assembled patterns comprising a block copolymer, a thermal acid generator and an organic solvent, and a method for forming a fine pattern using the composition. Specifically, forming a self-assembled first contact hole pattern using the composition on the etched layer formed on the semiconductor substrate; Applying a composition for pattern reduction on the entire surface including the first contact hole pattern; Baking the pattern reduction composition to form a crosslinking layer between the first contact hole pattern and an interface of the pattern reduction composition; And removing the pattern reducing composition to form a second contact hole pattern having a pitch size smaller than that of the first contact hole pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012086986-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150067239-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160061971-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8481429-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012086986-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101235360-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9099399-B2 |
| priorityDate |
2008-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |