http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090078524-A

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filingDate 2008-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d82ff963c344a550f56f3ffc71fba10a
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publicationDate 2009-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20090078524-A
titleOfInvention Stripping solution composition for removing photoresist residue and peeling method using the same
abstract The present invention relates to a peeling liquid composition for removing a photoresist residue comprising (A) an organic sulfonic acid compound, (B) a hydroxycarboxylic acid compound, (C) a polyhydric alcohol and (D) water, and a peeling method using the same. According to the present invention, in a manufacturing process such as a semiconductor device and a flat panel display device, a photoresist residue containing a cured and / or altered photoresist that may occur during an ashing process may be deposited by a batch method or a single sheet method. Alternatively, the present invention provides a peeling liquid composition for removing photoresist residues and a peeling method using the same, which can be easily removed by a spray method and can also prevent corrosion of the lower metal film and the insulating film exposed to the peeling liquid composition.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210062762-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8687492-B2
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type http://data.epo.org/linked-data/def/patent/Publication

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