http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090077736-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2009-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d2cc03259fd0ef1cbe1501931911114
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publicationDate 2009-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20090077736-A
titleOfInvention Photolithographic Reticle Processing Method
abstract Methods and apparatus are provided for etching a metal layer disposed on a substrate, such as a photolithographic reticle. In one aspect, a method is provided for substrate processing, the method comprising positioning a substrate in a processing chamber having a metal photomask layer applied on an optically transparent material, an oxygen containing gas, a chlorine containing gas, and a trifluorine At least one of romethane (CHF 3 ), sulfur hexafluoride (SF 6 ), hexafluoroethane (C 2 F 6 ) or ammonia (NH 3 ), and optionally a chlorine-free halogen-containing gas and / or an inert gas Introducing a processing gas into the processing chamber, generating a plasma of the processing gas within the processing chamber, and etching the exposed portion of the metal layer applied onto the substrate.
priorityDate 2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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