http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090077167-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ae372ddaa494f2face39592b0429cc16 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03F3-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H04R3-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-183 |
| filingDate | 2008-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf6bc3e77a0d35eccb5443e7a27061c6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29674b1a99eac39cab147533737a1095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35e18104162a5fa4b131f016dc418962 |
| publicationDate | 2009-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20090077167-A |
| titleOfInvention | Single Mode Vertical Resonant Surface Emitting Laser with Micro Lens and Manufacturing Method Thereof |
| abstract | A lower reflector layer formed on the semiconductor substrate and at least two semiconductor material layers having different oxidation rates alternately stacked on the semiconductor substrate, a resonator layer formed on the lower reflector layer, and on the resonator layer At least two semiconductor material layers formed on the ohmic contact layer and an ohmic contact layer formed on an upper surface of the oxidizable layer, and having different oxidation rates. A microlens having a curvature radius at the center by stacking an upper reflector layer having a mode selection opening for suppressing a higher order transverse mode at the center and a semiconductor material layer formed on the upper reflector layer and gradually increasing the oxidation rate By including the microlens formation layer is formed, the current injection hole and the mode selection opening portion in a single oxidation process There is an effect that it is possible to operate in a stable single mode, without an additional process step to form the microlenses. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11594859-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110892597-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022197000-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102436567-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11456575-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220129196-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110892597-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104300362-A |
| priorityDate | 2008-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.