http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090076535-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a251ae79dd7a008d95010b238c6aa1f8
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L2300-0636
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2035-00158
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-543
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-68
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-48
filingDate 2008-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec360d17e3c14b010cd5697a2f303316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bb4929afee54fca3e02a6faf5dbeed0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9cf796470ca1b30c76239a4df3e119b8
publicationDate 2009-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20090076535-A
titleOfInvention Biochip Manufacturing Method Using Atmospheric Pressure Plasma and Its Biochip
abstract The present invention relates to a method for manufacturing a biochip and a biochip, wherein the method for manufacturing a biochip formed by patterning a biomaterial on an upper surface of a substrate includes supplying a first reaction gas to a plasma generating apparatus under normal pressure, and applying an alternating current to the plasma. Generating a first step; Mounting a patterned mesh on the substrate; And placing a substrate on which the mesh is seated in an atmospheric pressure plasma generation region caused by the first reaction gas, thereby forming an activation region or an inactivation region related to the biomaterial on the substrate by atmospheric pressure plasma. A method of manufacturing a biochip using atmospheric pressure plasma and a biochip manufactured thereby are provided as a technical gist. Accordingly, the present invention forms an active region or an inactive region related to a biomaterial on the upper surface of the substrate by atmospheric pressure plasma treatment, thereby simplifying the process, having high reproducibility, high integration, and rapid manufacturing.
priorityDate 2008-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61365
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451186576

Total number of triples: 25.