| abstract |
The present invention relates to a photosensitive silicone resin composition, a cured film or a patterned cured film prepared using the same, and a semiconductor device or a display device including the same, and more particularly, a photopolymerizable functional group that can be polymerized by a radical reaction. A photosensitive silicone resin composition comprising a silicone resin having a photoinitiator, a secondary or tertiary amine, and an organic solvent, and a cured film or patterned cured film prepared therefrom and a semiconductor device or display device comprising the same.n n n The cured film prepared from the photosensitive silicone resin composition of the present invention can be developed with an aqueous alkali solution, and has excellent transparency, corrosion resistance, mechanical strength, dimensional stability, and electrical properties, such as a protective film, an insulating film, and an optical waveguide circuit of a semiconductor device or a display device. Can be used for manufacture. |