http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090075392-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_717c792fca7cc9c290c9db33e8fe078b |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-887 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0015 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2008-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8e1f7962796f0bad6962c5dd4c45246 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3878544d8f5c873aea80961e57bf289 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c669b2bccd6d75512b9a629b96cef297 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e08e69c561c48dd079c1532ad20351f8 |
| publicationDate | 2009-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20090075392-A |
| titleOfInvention | 적층 Multi-layered structure for manufacturing mold for nanoimprint lithography and mold for nanoimprint lithography |
| abstract | Disclosed are a mold for manufacturing UV nanoimprint lithography and a mold for UV nanoimprint lithography. UV nanoimprint lithography mold according to the present invention is a transparent substrate, a discharge layer made of a conductive material that transmits light formed on the transparent substrate, a protective layer that transmits the light formed on the discharge layer and prevents damage to the discharge layer, protection And a patterned silicon layer formed on the layer. According to the present invention, a silicon oxide layer that protects the discharge layer is formed on the discharge layer so that the discharge layer is not damaged during surface treatment with a pyrana solution. In addition, since the UV nanoimprint lithography mold according to the present invention is simply formed by one etching process, the manufacturing cost can be reduced, and since the mold having a large aspect ratio can be clearly patterned as designed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022314173-A1 |
| priorityDate | 2008-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.