abstract |
Disclosed is an atomic layer deposition apparatus that decomposes a source gas into radicals using UV energy. The atomic layer deposition apparatus includes a radical generating unit that decomposes a source gas into radicals by irradiating ultraviolet rays, and deposits a thin film by alternately supplying a source gas decomposed into radicals and another source gas. Therefore, by increasing the reactivity of the source gas it is possible to improve the processing speed and reaction efficiency of the deposition process, and to improve the quality of the deposited thin film. |