http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090053067-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89d24a372184d26135709177b13f5b95 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32055 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate | 2007-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c07f37a608b4ac0e375a7de451bf0bb1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86bf602c3328cce6ae998008baa44b76 |
| publicationDate | 2009-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20090053067-A |
| titleOfInvention | Amorphous carbon film, its formation method and manufacturing method of semiconductor device using same |
| abstract | The present invention relates to an amorphous carbon film, a method for forming the same, and a method for manufacturing a semiconductor device using the same.n n n In the amorphous carbon film according to the present invention, the inert gas and the source gas are introduced into the chamber, the plasma is excited, and the inert gas is interrupted to form the amorphous carbon film using only the source gas. The hydrocarbon compound in a liquid state having a single bond (CC) and at least one or more double bonds (C = C) is formed using a source gas vaporized.n n n According to the present invention, it is possible to prevent an increase in the refractive index and extinction coefficient of the amorphous carbon film generated when the inert gas is continuously introduced during the formation of the amorphous carbon film, thereby improving the reliability of the photolithography process. The reliability of the semiconductor element using a carbon film as a hard mask film can be improved.n n n n Amorphous carbon film, refractive index, extinction coefficient, inert gas, cyclic, single bond, double bond |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014149175-A1 |
| priorityDate | 2007-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.