http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090049204-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b828305495e1cdb63947a3a18aa633d1 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2007-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66b2f9857ccdf59f02c9edaf84785ff5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e7322b2681cc5e331bf5a9ff826a7f5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3686f1639c4f8c572f5e2190324ba9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b8eeaaeb59b67dba8fb80e85d4a7daf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66de3e0218a4494668e64ee840a5d8f5 |
| publicationDate | 2009-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20090049204-A |
| titleOfInvention | Polymer for immersion photoresist and composition comprising same |
| abstract | The present invention relates to a immersion photoresist polymer and a composition for immersion photoresist comprising the same, and more particularly, to a immersion photoresist polymer represented by the following formula (100). n Formula 100 n n n n R 1 in the above formula And R 4 each independently represent a hydrogen atom, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group, or an alkyl group having 1 to 20 carbon atoms, including or without an aldehyde group, and R 2 is hydrogen or a methyl group R 3 is a linear, branched alkyl or cycloalkyl group having 1 to 10 carbon atoms, X is H or CF 3 , and l, m, n are each a number representing a repeating unit in the main chain, and l + m + n = 1, 0.1 <l / (l + m + n) ≦ 0.6, 0.1 <m / (l + m + n) ≦ 0.6, 0.1 <n / (l + m + n) ≦ 0.4. n The immersion photoresist polymer of the present invention has sufficient transmittance at KrF (248 nm) and ArF (193 nm) exposure wavelengths during immersion exposure, and modifies the properties of the resist film surface after photoresist coating to form a stable film against water. It is possible to prevent the elution from the surface and to adjust the appropriate receiving angle value required for the immersion exposure. In addition, it is possible to minimize water mark defects or bubble defects that may occur during irradiation. n n Additives for immersion photoresists, immersion photoresist |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8632938-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017021342-A |
| priorityDate | 2007-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.