| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3148
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2007-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3841c87c920449d2fe6d182f5884166f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77e8ba54cbf4714ad104430f406bafc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25d0b61a467bbffe39ff707047653338
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb8b4e0ce8a42ee7ee3f3e656650aaae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb0c31db9b1fa0945fd9f431684922fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7535312ace812d59831a879fcfec0323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f5ccb1767df3728ec015a38ed394e5c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc191de60704a84391964704136600af |
| publicationDate |
2009-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090049074-A |
| titleOfInvention |
Reduced overall defects on the PCD film |
| abstract |
The present invention generally provides an apparatus and method for reducing defects on films deposited on semiconductor surfaces. One embodiment of the present invention provides a method for depositing a film on a substrate. The method comprises treating the substrate with a first plasma configured to reduce pre-existing defects on the substrate, and applying silicon and carbon by applying a second plasma generated from at least one reactant gas and at least one precursor. And depositing a film comprising a on the substrate. |
| priorityDate |
2006-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |