http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090044513-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_167dbb764bb0307c6ad4781467c94150 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32 |
| filingDate | 2007-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_add5db6a60f3a031c919dc13d2337fde http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7dcf3b06a0f1df886049c91915b13d5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a7012ef813dfd22d102a7f690fd206f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca8318a3626431645119e5ce4752fd55 |
| publicationDate | 2009-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20090044513-A |
| titleOfInvention | Manufacturing method of gray tone blank mask and gray tone photo mask |
| abstract | The present invention is to solve the unstable process by adjusting the etching temperature during the wet etching process of the semi-transmissive membrane constituting the gray tone blank mask, easy to control the etching rate, and excellent chemical resistance to chemicals such as chromium etching liquid and cleaning liquid The present invention relates to a method for manufacturing a gray tone blank mask and a gray tone photo mask provided with a light transmitting film. In addition, in the dry etching process of the light shielding film constituting the gray tone blank mask, the gray etch blank mask for flat panel display, which can accurately manufacture the transmittance of the semi-transmissive film pattern by solving the problem of low etching selectivity with the lower semi-transmissive film, and It relates to a gray tone photomask.n n n In addition, in order to achieve the above object, in the present invention, it is preferable to prepare an etching process and a semi-transmissive membrane that do not cause a fatal damage to an expensive lower transparent substrate during the dry and wet etching process of the semi-transmissive membrane.n n n In addition, in order to achieve the above object, the translucent film of the present invention includes tantalum, and the tantalum is further used as a compound containing a metal and a semiconductor element such as aluminum and silicon, and the light shielding film and the antireflection film are wet-etched with the tantalum alloy. It is characterized by using a process made of chromium having a high selectivity and a process made of a light-transmitting film and an antireflection film composed of chromium and a semi-transmissive film, and a tantalum alloy having a high chromium and wet etching selectivity and a compound thereof.n n n In addition, in order to manufacture the gray tone photomask, in the present invention, the second semi-transmissive part pattern composed of a semi-transmissive film that can be manufactured by only two exposure processes, the sub-resolution on the semi-transmissive film and the semi-transmissive film Manufacture of a liquid crystal display device comprising a first semi-transmissive portion pattern, a light-shielding portion pattern, and a light-transmitting portion pattern composed of an etch stop layer on a light blocking film and an antireflection film or a semi-transmissive film and a semi-transmissive film having a line and space shape. It is characterized in that the manufacturing process of the gray tone blank mask and gray tone photo mask consisting of a transmission control region of more than four steps to further reduce the unit cost.n n n n Gray tone blank mask, gray tone photomask, tantalum and tantalum alloys, chrome, translucent film |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103235480-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I461837-B |
| priorityDate | 2007-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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