| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D401-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D213-643
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D498-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D417-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D471-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-328 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate |
2007-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_965c914ec970566cea33def2ed09574c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4bf9c1d953f16629300ffbb37116cfe |
| publicationDate |
2009-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090039928-A |
| titleOfInvention |
Photoresist composition and pattern formation method using the same |
| abstract |
The present invention can easily adjust the embossing pattern and can also be used as an organic insulating film composition for negative transflective, (A) an alkali-soluble copolymer; (B) monomers containing 2 to 64 acrylic functional groups; (C) a radical generating photoinitiator containing an α-amino acetphenone derivative represented by Formula 1; And (D) relates to a photoresist composition containing a solvent and a pattern forming method using the same.n n n <Formula 1> |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160036916-A |
| priorityDate |
2007-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |