| abstract |
A high molecular compound capable of forming a fine pattern having excellent resolution and good rectangularity and having good resist properties even when the acid generated from the acid generator is weak and having good sensitivity. The photoresist composition using this high molecular compound, and the resist pattern formation method using this photoresist composition are provided. These photoresist compositions and the resist pattern formation method have an alkali-soluble group (i), and this alkali-soluble group (i) is at least 1 sort (s) of substituent chosen from alcoholic hydroxyl group, a carboxyl group, and phenolic hydroxyl group, These Giga, the following general formula (1)n n n [Formula 1]n n n n n n n n (In formula, R < 1> is a C20 or less aliphatic cyclic group which may have oxygen, nitrogen, sulfur, or a halogen atom, n shows the integer of 0 or 1-5.) The acid dissociable, dissolution inhibiting group represented by A high molecular compound protected by (ii) is used. |