| abstract |
The present invention relates to a nanostructure of the block copolymer formed on the surface pattern of a shape that does not match the nanostructure of the block copolymer, and more particularly, to a cycle that does not match the cycle of the block copolymer The present invention relates to a nanostructure of a block copolymer prepared by forming a block copolymer thin film on a substrate patterned with a pattern and then thermally treating the same.n n n According to the present invention, a nanostructure of a block copolymer is prepared on a patterned substrate, but the nanostructure may be manufactured in a simplified process without undergoing a process of matching the cycle of the pattern with the cycle of the block copolymer, Nanostructures of various structures can be implemented according to the relative composition ratio and fraction of each block of the coalescence, or according to the period of the pattern, and the degree of alignment of the nanostructures can be arbitrarily controlled. The structure can be easily manufactured, and can be applied to practical industries for various purposes.n n n n Pattern, self-assembly, block copolymer, nanostructure |