| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2007-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_381de81b1f3fad7df1c4007aacaa45f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_280629aa9cfbeca26303e077267e143f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32a967e31db7360d42b6cde53b403b50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d0eec37fb082c5a7f689be97b0429e0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_108d1bb75db5370aede685b3152590f3 |
| publicationDate |
2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090024246-A |
| titleOfInvention |
Pattern Forming Method and Composition for Organic Thin Film Formation Used in the Same |
| abstract |
The present invention provides a lower layer containing (1) a radiation-sensitive acid generator that generates an acid by (C) radiation on a substrate or (D) a radiation-sensitive base generator that generates a base by irradiation with radiation. Forming a film, (2) irradiating the lower layer film through a mask having a predetermined pattern to expose the lower layer film, and forming a portion of the exposed lower layer film selectively exposed to the predetermined pattern; (3) forming an organic thin film (E) on the underlayer film and chemically bonding the exposed underlayer film portion to the organic thin film formed on the exposed underlayer film portion; and (4) exposure in the underlayer film The pattern formation method which has the process of removing the said organic thin film formed on parts other than an underlayer film part. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130102495-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014163332-A1 |
| priorityDate |
2006-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |