| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8a16e2fa556744225f7c2bba36087e7f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2006-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c03dcd47c967ca26ebe5c518f3a0027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93cec1d1b44f36c8c21eb2f2b616ee8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1ea462b6f454a583bc56d2a1104515a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e8a5a8d7f896f38575d767ac1959ffb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60718ba155cf9daa67de795881b214a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ae07a920cb453e32809558df0ec847a |
| publicationDate |
2009-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090018734-A |
| titleOfInvention |
Positive photosensitive resin composition, manufacturing method of pattern and electronic component |
| abstract |
Provided are a positive photosensitive resin composition for an electronic material having good adhesion and sensitivity to a film without causing a corrosion reaction to copper and a copper alloy such as metal wiring, and a method for producing a pattern and an electronic component. Positive type photosensitive resin composition is (A) following General formula (I)n n n [Tue 1]n n n n n n n n (Wherein X is a divalent organic group, Y is a tetravalent organic group, R 1 is hydrogen or a monovalent organic group, m is an integer of 2 to 500 and represents the number of repeat units in the polymer.)n n n It contains the polybenzoxazole precursor which has a structure represented by (b), (B) solvent, (C) tetrazole derivative, and (D) the compound which generate | occur | produces an acid by light. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101875214-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190126616-A |
| priorityDate |
2006-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |