http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090018638-A

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publicationDate 2009-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20090018638-A
titleOfInvention Structure and method for forming shield gate trench field effect transistor connected with shield electrode and gate electrode
abstract The field effect transistor (FET) includes a plurality of trenches extending into the semiconductor region. Each trench includes a gate electrode and a shield electrode, an interelectrode dielectric exists between the gate electrode and the shield electrode, and the shield electrode and the gate electrode are electrically connected.
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