| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-42 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2008-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_557eda272d6263ef54a669a9df0c36e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a533bb89ef253532dbf99c8209714b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35461eb44b3375a5381d66b661334d04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00bd01cc4f33b0c347e6c92559642e35 |
| publicationDate |
2009-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090006769-A |
| titleOfInvention |
Method for film formation of porous membrane and computer readable recording medium |
| abstract |
Oxygen plasma treatment was performed on the surface of the SiOCH film formed by the plasma CVD method using an organic silicon compound raw material to form a surface densification layer, and further, the surface densification of CH x groups or OH groups was carried out from the SiOCH film under the surface densification layer by hydrogen plasma treatment. Release at a controlled rate through the layer to form a porous low dielectric constant film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014158351-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9324571-B2 |
| priorityDate |
2007-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |