http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20090004716-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2008-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0add81bb44226ce3a7adcf9dd82631 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b91be0fb738fb2c71aa9dcc2a16bf99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f04400920727cf56f01b5702ae1a91 |
| publicationDate | 2009-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20090004716-A |
| titleOfInvention | Silicon-containing film forming composition, silicon-containing film, silicon-containing film forming substrate and pattern forming method using the same |
| abstract | The present invention is a silicon-containing compound obtained by hydrolytically condensing a hydrolyzable silicon compound using (A) acid as a catalyst,n n n (B) a compound represented by the following formula (1) or (2),n n n <Formula 1>n n n L a H b Xn n n (L is Li, Na, K, Rb or Ce, X is a hydroxyl group or an organic acid group, a is at least 1, b is 0 or at least 1)n n n <Formula 2>n n n M a H b An n n (M is sulfonium, iodonium or ammonium and A is the X or non-nucleophilic counter ion)n n n (C) an organic acid,n n n (D) an alcohol having a cyclic ether as a substituent,n n n (E) organic solventn n n It provides a composition for forming a thermosetting silicon-containing film comprising a.n n n By using the silicon-containing intermediate film formed from the composition for thermosetting silicon-containing film formation of this invention, favorable pattern formation is possible. In addition, the photoresist pattern can be transferred, and the substrate can be processed with high precision. |
| priorityDate | 2007-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID468380290 |
Total number of triples: 22.