http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080112412-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-712 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-712 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2007-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13814e23073e22d9eecdc7fb7d640788 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0b9fdcd02896bed15c330df43dce53d |
| publicationDate | 2008-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080112412-A |
| titleOfInvention | Compound, Positive Resist Composition, and Resist Pattern Formation Method |
| abstract | assignmentn n n n Provided are a compound that can be used for a resist composition, a positive resist composition containing the compound, and a resist pattern forming method.n n n n Resolutionn n n n The compound represented by formula (A-1). R < 11> -R < 17> is an alkyl group or an aromatic hydrocarbon group in Formula (A-1); g, j is an integer of 1 or more, k, q is an integer of 0 or more, and g + j + k + q is 5 or less; b is an integer of 1 or more, l, m is an integer of 0 or more, and b + l + m is 4 or less; c is an integer of 1 or more, n, o is an integer of 0 or more, and c + n + o is 4 or less; A is a trivalent organic group having a trivalent aromatic cyclic group, an alkyl group, an aliphatic cyclic group, or an aromatic cyclic group or an aliphatic cyclic group; Z is group represented by Formula (z1). In formula (z1), Y is a divalent organic group which has an alkylene group, a bivalent aromatic hydrocarbon group, an aliphatic cyclic group, or an aromatic hydrocarbon group or an aliphatic cyclic group; R 'is an acid dissociable, dissolution inhibiting group.n n n [Formula 1] |
| priorityDate | 2006-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 240.