Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_41e00307d71a7333061f80cc9032f076 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5018 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
filingDate |
2007-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2ea73e7c5ee8a77c1fb87debd1a8964 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04e092c5c4efa225560d42aa9d024262 |
publicationDate |
2008-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20080108510-A |
titleOfInvention |
Cleaning Method of Device Substrate |
abstract |
The present invention provides a method for cleaning a device substrate capable of sufficiently removing the resist attached to the device substrate, in particular, the resist attached to the hole of the fine pattern having a large aspect ratio. A cleaning method for a device substrate comprising a cleaning step of removing a resist attached to the device substrate using a solvent, wherein the solvent is at least selected from the group consisting of hydrofluoroether, hydrofluorocarbon, and perfluorocarbon It is a composition containing 1 type of fluorine-containing compound and fluorine-containing alcohol, The cleaning method of the device substrate characterized by the above-mentioned. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180081122-A |
priorityDate |
2006-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |