http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080107306-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6fc8bbba7dbfdc1fe42f350fc84e17a3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C23-0075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02019 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
| filingDate | 2008-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac1fb5a03fb4276f0c0af87eca392496 |
| publicationDate | 2008-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080107306-A |
| titleOfInvention | Alkaline aqueous solution composition for cleaning or etching of substrate |
| abstract | Aqueous solutions such as ammonia, tetramethylammonium hydroxide, and sodium hydroxide are used as cleaning and etching liquids for semiconductor substrates and glass substrates. The process is necessary. In addition, in the case of the cleaning liquid, it is effective to remove the fine particles, but since the metal impurities are not washed, it is necessary to carry out pickling, which makes the process complicated.n n n The present invention provides an aqueous solution composition having no adhesion of metal impurities to the aqueous alkali solution and having a better cleaning ability.n n n An alkaline aqueous solution composition for cleaning or etching a substrate,n n n General formula (1),n n n n n n n n "In the above formula, R may be any one or two or more hydrogens may be substituted with the same or different substituents, an alkylene group having 2 to 6 carbon atoms, 1, 2-cyclohexylene group, or 1, 2-phenylene group, The ring A and B may be substituted with arbitrary 1 or 2 or more hydrogens by the same or another substituent, and are a benzene ring, where a substituent is a C1-C10 alkyl group, a C1-C10 alkenyl group, and C1-C1 -10 alkynyl group, C1-C10 acyl group, C1-C10 alkoxy group, phenyl group, benzyl group, naphthyl group, carboxyl group, sulfonic acid group, cyano group, hydroxyl group, thiol group, amino group, halogen and nitro The aqueous solution composition containing a chelating agent and an alkali component, which is selected from the group consisting of groups ”, prevents the adsorption of metal impurities onto the substrate and further washes the metal impurities adsorbed on the substrate. |
| priorityDate | 2007-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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