| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4586
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32623
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate |
2008-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7f4a3d72f0a405e21eb1d2340472fd1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29d86490305cf48157d6d4c81a0de428
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec213ca362218f33857a4150781205cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fb372bd1c1015cc794d6c9a8f76a553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f18e26175c50ccb976418978ceb8da8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c038dd29bec0cf2c4a9e21ee9b8a2317 |
| publicationDate |
2008-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20080106572-A |
| titleOfInvention |
Deposition Method and Deposition Device |
| abstract |
A film deposition method in which a metal film is deposited on a surface of a substrate by supplying gaseous molecules of a metal carbonyl raw material to the surface of the substrate and decomposing in the vicinity of the surface of the substrate. And providing a step of preferentially decomposing the metal carbonyl raw material in a region adjacent to an outer circumferential portion of the substrate to be processed to locally increase the concentration of CO in the atmosphere near the outer circumferential portion of the substrate to be processed. Suppresses the deposition of membranes. |
| priorityDate |
2007-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |