| abstract |
1) A polymer compound for photoresist compositions having a high dissolution rate in a developing solution after exposure and small swelling during development, and 2) a polymerizable compound serving as a raw material. Moreover, 3) the photoresist composition containing this high molecular compound is provided. Specifically,n n n General formula (1)n n n [Formula 1]n n n n n n n n (Wherein, R 1 and R 2 is one, combination thereof, to form a ring together with the carbon atom to which the one R 1 and R 2 are carbon atoms which may contain an oxygen atom at any position 2 The linear, branched or cyclic alkylene group of ˜9 is represented, R 3 represents a hydrogen atom or a methyl group, W represents a linear, branched or cyclic alkylene group having 1 to 10 carbon atoms. n represents 0 or 1)n n n It provides a tertiary alcohol derivative represented by. |