| abstract |
Compounds represented by the following general formula (b1-8); Compounds represented by the following general formula (b1-9); A resist composition containing a base component (A) whose solubility in an alkaline developer is changed by the action of an acid and an acid generator component (B) which generates an acid by exposure, wherein the acid generator component (B) is represented by the following general The acid generator (B1) which consists of a compound represented by a formula (b1-8), or the acid generator (B1 ') which consists of a compound represented by the following general formula (b1-9) is contained. In formula (b1-8), R 401 is an acid dissociable group, R 41 to R 43 are each independently a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxyl group, or a hydroxyalkyl group, and Q is divalent. A linking group or a single bond; n 0 is an integer of 1 to 3, n 1 to n 3 are each independently an integer of 0 to 3, provided that n 0 + n 1 is 5 or less; X - is anion. In formula (b1-9), R 402 and R 403 are each independently a hydrogen atom, an alkyl group, or a halogenated alkyl group, R 404 is an alkyl group or a halogenated alkyl group, and R 403 and R 404 are bonded to each other to form a ring structure May be done; R 41 ~ R 43, n 0 , n 1 ~ n 3 and X - are the same as-the formula (b1-8) of the R 41 ~ R 43, n 0 , n 1 ~ n 3 and X.n n n [Formula 1]n n n n n n n n [Formula 2] |