| abstract |
It provides a novel curable composition for photo nanoimprint lithography excellent in photocurability. 0.00-50 mass% of at least 1 sort (s) of 35-99 mass% of polymerizable unsaturated monomers, 0.1-15 mass% of photoinitiators, a fluorine-type surfactant, a silicone type surfactant, and a fluorine-type silicone surfactant, and 0.1-50 mass% of inorganic oxide fine particles. Curable composition for optical nanoimprint lithography comprising a. |