http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080066845-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2006-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_968a9fb00a21712fff7f224cafa32388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0be7e5e7d2ae4ca2faf64e7c640a81a |
| publicationDate | 2008-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080066845-A |
| titleOfInvention | Photosensitive composition, photosensitive film, permanent pattern and method of forming the same |
| abstract | The present invention contains a compound which does not cause a reaction at low temperature or normal temperature at the time of storage, is excellent in storage stability, causes crosslinking reaction by heating to promote curing of the resin, and obtains a good film curing degree of the cured film. Can form an image, has low surface tackiness, good lamination and handling properties, excellent storage stability, high sensitivity and developability, and excellent chemical resistance after development, surface hardness, heat resistance, dielectric properties, etc. It is an object of the present invention to provide a photosensitive composition expressing a light, a photosensitive film using the same, a high-precision permanent pattern, and an efficient method for forming the same.n n n To this end, two or more polymers (A) having at least one of at least one carboxyl group and ester group in one molecule, (B) polymerizable compound, (C) photopolymerization initiator, and (D) oxirane ring in one molecule The photosensitive resin composition containing the specific compound which has, the photosensitive film, a permanent pattern, and its formation method are provided. |
| priorityDate | 2005-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 610.