| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a8a9982b1666c54b5bf02d6c944891e4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-23 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B32-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-066
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1453
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B20-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C4-0085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C4-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B19-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B19-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C4-00 |
| filingDate |
2006-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b87a742dc820266fd2cb7041e3fc47c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b643e8cbbb2db2a777c7e1ef2e39cb4d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_386540b483769cb131c6ce56d4e0815f |
| publicationDate |
2008-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20080065703-A |
| titleOfInvention |
Dehydroxyl-doped silica glass, optical member, and lithographic system comprising the same, and method for manufacturing same |
| abstract |
The disclosure includes OD-doped synthetic silica glass that can be used in the optical path of lithographic irradiation of lithographic apparatus operating at wavelengths less than about 300 nm. It was found that OD-doped synthetic silica glass had significantly lower polarization-induced birefringence compared to non-OD-doped silica glass with equivalent OH concentrations. Also disclosed is a method of making OD-doped synthetic silica glass, and an optical member comprising such glass, a lithographic system comprising such optical member. The glass is particularly suitable for immersion lithography systems because of its significantly low polarization-induced birefringence value at about 193 nm. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101494470-B1 |
| priorityDate |
2005-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |