| abstract |
As a positive resist composition for liquid immersion exposure which has an acid dissociable, dissolution inhibiting group, and contains the resin component (A) which increases alkali solubility by the action of an acid, and the acid generator component (B) which generates an acid by exposure, The positive resist composition for liquid immersion exposure in which the said resin component (A) contains a main chain cyclic polymer (A1) and the non-chain cyclic polymer (A2) which has a structural unit (a) derived from acrylic acid in a main chain. |