http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080056861-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2006-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea64b4903be77235d937a095b9bb56d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25de729a89ff274a8153fbc573d60058 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0e8659d848823f8734b40a36a889579 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce39a5578b98d008b01efd1895f7ec1d |
| publicationDate | 2008-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080056861-A |
| titleOfInvention | Negative photoresist composition |
| abstract | The negative photoresist composition contains an acrylic copolymer, a photoinitiator, a crosslinking agent, a silicone surfactant, and an extra solvent obtained by reacting a monomer containing an unsaturated carboxylic acid compound with an unsaturated compound containing an epoxy group. The content of solids of the negative photoresist composition is 10 to 40% by weight based on the total weight of the composition, the content of the acrylic copolymer is 25 to 70% by weight relative to the weight of the total solids, and the content of the photoinitiator is total solids. 5 to 25% by weight based on the weight of the crosslinking agent, the content of the cross-linking agent is 10 to 50% by weight based on the total weight of solids, the content of the silicone-based surfactant is 0.02 to 3% by weight based on the total weight. The negative photoresist composition may form an organic insulating layer having a high transmittance, and may reduce the residue of the organic insulating layer. Therefore, display quality of the display device including the organic insulating layer may be improved. |
| priorityDate | 2006-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 272.