http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080042980-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_167dbb764bb0307c6ad4781467c94150 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2006-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_add5db6a60f3a031c919dc13d2337fde http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca8318a3626431645119e5ce4752fd55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96c4e658f1cf1cdba566dd357e4d799c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aebfe1a66bd7fb0295080e5f9151e160 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7dcf3b06a0f1df886049c91915b13d5 |
publicationDate | 2008-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20080042980-A |
titleOfInvention | Halftone Phase Inverted Blank Mask |
abstract | The present invention relates to a halftone phase inversion blank mask applied to a semiconductor photolithography process, and more particularly to a halftone phase inversion blank mask suitable for ArF lithography capable of realizing a minimum line width of 90 nm or less.n n n The configuration of the present invention for this purpose is characterized in that the first phase inversion film, the second phase inversion film, the light shielding film, the antireflection film, the resist film is a halftone phase inversion blank mask sequentially formed.n n n This makes it possible to manufacture high quality photomasks with characteristics such as transmittance control, phase reversal control, excellent selectivity, excellent transmittance for exposure wavelengths and inspection wavelengths, and, ultimately, high performance semiconductor devices having excellent performance. Done. |
priorityDate | 2006-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.