http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080042980-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_167dbb764bb0307c6ad4781467c94150
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2006-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_add5db6a60f3a031c919dc13d2337fde
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca8318a3626431645119e5ce4752fd55
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96c4e658f1cf1cdba566dd357e4d799c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aebfe1a66bd7fb0295080e5f9151e160
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7dcf3b06a0f1df886049c91915b13d5
publicationDate 2008-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20080042980-A
titleOfInvention Halftone Phase Inverted Blank Mask
abstract The present invention relates to a halftone phase inversion blank mask applied to a semiconductor photolithography process, and more particularly to a halftone phase inversion blank mask suitable for ArF lithography capable of realizing a minimum line width of 90 nm or less.n n n The configuration of the present invention for this purpose is characterized in that the first phase inversion film, the second phase inversion film, the light shielding film, the antireflection film, the resist film is a halftone phase inversion blank mask sequentially formed.n n n This makes it possible to manufacture high quality photomasks with characteristics such as transmittance control, phase reversal control, excellent selectivity, excellent transmittance for exposure wavelengths and inspection wavelengths, and, ultimately, high performance semiconductor devices having excellent performance. Done.
priorityDate 2006-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457698762
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577374
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559484
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577474
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID455728551
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559537
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID135777636
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419550829
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID281
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458427267
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569943
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23987
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419539344
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID222
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23986
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426146495
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577473
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569950
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23965
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID280
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23935
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID948
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3609161
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23991
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID945

Total number of triples: 53.