| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_82cbc291d77c061ac9a216f86ec010a3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2406
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-461
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32201
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32229 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| filingDate |
2007-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49223c60ffc714ea13ab7f9d05dc4ea5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e442309e1579b4a82d57067a6050e28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_584746dbd7c0ebf3b71da98d78f55b77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87d70390f2016eea9db35efaee6ef7da |
| publicationDate |
2008-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20080034079-A |
| titleOfInvention |
Plasma processing apparatus and its operation method, plasma processing method and manufacturing method of electronic device |
| abstract |
The present invention provides a technique capable of cleaning deposits in a processing chamber with a simple configuration requiring no remote chamber, a dedicated microwave source, or the like. To this end, the plasma processing apparatus, in which a predetermined gas supplied into the processing chamber is made into plasma by microwaves propagated through the waveguide and propagated to the dielectric disposed on the inner surface of the processing chamber, is subjected to plasma treatment on the processing target object disposed in the processing chamber. As a waveguide, a space portion surrounded by a partition wall made of at least a portion of a dielectric material is formed in the waveguide, and a cleaning gas flow path for supplying a cleaning gas to the processing chamber is provided through the space portion. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112272862-A |
| priorityDate |
2006-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |