abstract |
INDUSTRIAL APPLICABILITY According to the present invention, the core shell structure can be used as a polymer material for manufacturing nanoparticles based on lithography, and has improved dry etching resistance, sensitivity, and surface smoothness, and the shell portion includes an acid such as vinyl benzoate tert butyl ester. A hyperbranched polymer having degradable repeating units, and a resist composition containing the hyperbranched polymer is provided. |