http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080029654-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76224
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-762
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762
filingDate 2006-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed35b19a1b5fb69f3215812f841c530d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd315542802e4b6bd322a9f26d93305f
publicationDate 2008-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20080029654-A
titleOfInvention Device Separating Method of Semiconductor Device
abstract The present invention is to provide a method for forming a device isolation film of a semiconductor device that can prevent the loss of the liner nitride film that causes the moat, the method of forming a device isolation film of a semiconductor device of the present invention to prepare a substrate with a trench step; Forming a sidewall oxide film on a surface of the trench; Forming a liner nitride film on the sidewall oxide film; Oxidizing a portion of the liner nitride film to form an oxynitride film; Forming an insulating layer on the oxynitride layer to gap-fill the trench; And planarizing the insulating film, wherein the above-described present invention oxidizes a portion of the liner nitride film before the gap fill oxide film is deposited so that the gate oxide film thinning phenomenon in the moat region caused by the thickness change of the liner nitride film according to the process proceeds. Can be prevented and thus the reliability of the gate oxide film can be improved.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11659660-B2
priorityDate 2006-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 30.