http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080028322-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2007-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ab9fd0e67049447b5c4db1f50f5e898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a4c297fe26465f427b7bf18a643a56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6acf5e1e430edb1a472bee86f7be035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f |
| publicationDate | 2008-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080028322-A |
| titleOfInvention | Positive photosensitive composition and pattern formation method using same |
| abstract | [PROBLEMS] Positive photosensitive compositions used in the production of circuit boards such as semiconductor manufacturing processes such as ICs, liquid crystals, thermal heads, and other photofabrication processes, and pattern forming methods using the same, which form fine patterns of 100 nm or less. The present invention also provides a positive photosensitive composition having improved pattern collapse and exposure latitude performance, and a pattern forming method using the same.n n n As a positive photosensitive composition containing (A) a compound which generates an acid by irradiation of actinic light or radiation, and a resin whose dissolution rate in an alkali developer is increased by the action of (B) acid, the above-mentioned ( B) A component is a positive photosensitive composition which has a repeating unit represented by a specific structure and has an acid-decomposable group, and the pattern formation method using the same. |
| priorityDate | 2006-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 160.