http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080021511-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00 |
| filingDate | 2007-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_515fbda82913831336a0df5c617d3967 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88bcabb3e0a0101711e37439a9856f96 |
| publicationDate | 2008-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080021511-A |
| titleOfInvention | A method for producing a polymer compound, a polymer compound produced by the production method, a positive photosensitive composition containing the polymer compound, and a pattern forming method using the positive photosensitive composition |
| abstract | A method for producing a polymer compound having a higher sensitivity and improved pattern collapse than a conventional product used for fine pattern formation such as semiconductor production, a polymer compound produced by the production method, a positive photosensitive composition containing the polymer compound, and this positive It provides a pattern forming method using a photosensitive composition.n n n Specifically, in the method for preparing a polymer compound for polymerizing a polymerizable compound having an ethylenic double bond using a chain transfer agent and a polymerization initiator of a specific structure, the addition of a chain transfer agent (S) and a polymerization initiator (I) of a specific structure A method for producing a polymer compound, a polymer compound produced by the production method, a positive photosensitive composition containing the polymer compound, and a pattern forming method using the positive photosensitive composition, wherein the molar ratio (I / S) is 1.0 or less. to provide. |
| priorityDate | 2006-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 144.