| abstract |
The present invention discloses a pretreatment composition comprising: (a) a compound having at least one structure VI: , Wherein Y is S, O, NR 2 , (HOCH) p , and Each R 1 is H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group, or a halogen, and each R 2 contains H, SH, CH 3 , C 2 H 5 , and a thiol group A linear or branched C 1 -C 4 alkyl group; In the above, V 1 and V 2 And Independently selected from the group consisting of wherein m is independently an integer of 0 to 4, provided that Y = Can only be m = 0; n is an integer from 1 to 5; p is an integer from 1 to 4, and each R 1 is as defined above; And (b) at least one organic solvent; (c) optionally at least one adhesion promoter; The amount of the compound of structure VI present in the composition above is an amount effective to inhibit residue generation when a photosensitive composition is coated on the substrate and the coated substrate is treated to form an image on the substrate. |