http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080018823-A

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filingDate 2007-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a639d1bfc2e11c07e227e8c675dece69
publicationDate 2008-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20080018823-A
titleOfInvention Polishing Compositions and Polishing Methods
abstract SUMMARY OF THE INVENTION An object of the present invention is a polishing composition capable of reducing the number of light point defects (LPD) resulting from polishing on the surface of a polishing object after polishing using the polishing composition, and a polishing method using the polishing composition. To provide.n n n The polishing composition of the present invention contains at least one water-soluble polymer and an alkali selected from polyvinylpyrrolidone and polyN-vinylformamide.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170118690-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170113539-A
priorityDate 2006-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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