http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080016972-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 |
| filingDate | 2006-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cf1ece880582fe73c6f7a6cc623e89c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b81f26ee3f2facee8355c7f9391cb545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0135c3a0ea945759f5da53be975bf32 |
| publicationDate | 2008-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080016972-A |
| titleOfInvention | Substrate Processing Apparatus, Substrate Manufacturing Method and Semiconductor Device Manufacturing Method |
| abstract | Provided is a substrate processing apparatus capable of accurately performing temperature control in a reaction tube.n n n The substrate processing apparatus 100 includes a reaction tube 42 for processing the substrate 54, a heater 46 for heating the substrate 54 in the reaction tube 42, and cooling outside the reaction tube 42. It has a cooling air flow path 72 which distributes the air 70, and the thermocouple 82 which detects the temperature around the reaction tube 42, and the thermocouple 82 is for cooling in the state covered with the protection tube 86. The cover member 88 is installed inside the cooling air passage 72 through which the air 70 flows, and blocks the flow toward the protection tube 86 of the cooling air 70 outside the protection tube 86. . |
| priorityDate | 2005-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.