http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080016406-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2006-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c204ea6a586c2039b34432dec7afccf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3b45166a0aef2fd043cbadf70b72fc6 |
publicationDate | 2008-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20080016406-A |
titleOfInvention | Method of Forming Resist Pattern, Semiconductor Device and Manufacturing Method Thereof |
abstract | According to the present invention, ArF (argon fluoride) excimer laser light can be used as the exposure light at the time of patterning, the thickness of the resist can be stably thickened without depending on the size of the resist pattern. It is an object of the present invention to provide a method of forming a resist pattern that can easily and efficiently form a fine resist removal pattern beyond the exposure limit (resolution limit) at low cost.n n n The method of forming a resist pattern according to the present invention comprises the steps of applying a resist pattern thickening material to cover the surface of the resist pattern after forming a resist pattern, a baking step of baking the resist pattern thickening material, and the resist And at least one developing step of developing and peeling the pattern thickening material, wherein at least one of the coating step, the baking step, and the developing step is performed a plurality of times. |
priorityDate | 2006-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 142.