| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-5096 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate |
2007-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbd7ed7f41b79921a39d88eb3b28ae86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce568abb788b325b03e5ea778947cbfb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f3863d848ff22ef6f2fbbadae2efeba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c1bb56fa9a048816b84ee6a0ac1755b |
| publicationDate |
2008-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20080007496-A |
| titleOfInvention |
How to form the film |
| abstract |
In the chamber 1 having a shower head 10 and an electrode 8 serving as a pair of parallel plate electrodes, a wafer W having holes having an opening diameter of 0.13 µm or less and / or an aspect ratio of 10 or more is disposed. do. The high frequency power is supplied from the high frequency power source 34 to the shower head 10 while introducing a processing gas containing a TiCl 4 gas and a H 2 gas to form a plasma therebetween. The plasma promotes the reaction of the processing gas to form a Ti film on the wafer. At this time, the value of the flow rate (mL / min (sccm)) of the power (W) / TiCl 4 gas of the high frequency electric power is set to 67 or less. |
| priorityDate |
2006-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |